发明授权
- 专利标题： Polycarbonate resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols)
- 专利标题（中）： 含有亚烷基双（苯并三唑基酚）的耐光变性的聚碳酸酯树脂组合物，
-
申请号： US945733申请日： 1986-12-22
-
公开(公告)号： US4812498A公开(公告)日： 1989-03-14
- 发明人: Yutaka Nakahara , Atsushi Nishimura , Toshio Nakajima
- 申请人： Yutaka Nakahara , Atsushi Nishimura , Toshio Nakajima
- 申请人地址： JPX Urawa
- 专利权人： Adeka Argus Chemical Co., Ltd.
- 当前专利权人： Adeka Argus Chemical Co., Ltd.
- 当前专利权人地址： JPX Urawa
- 主分类号： C08K5/3475
- IPC分类号： C08K5/3475 ; C08K5/34
摘要：
Polycarbonate resin compositions are provided having improved light stability and comprising an alkylidene bis(benzotriazolyl phenol)having the formula: ##STR1## wherein: R.sub.1 is selected from the group consisting of hydrogen and alkyl having from one to about eleven carbon atoms;R.sub.2 is selected from the group consisting of alkyl having from one to about twelve carbon atoms; and arylalkyl having from seven to about eighteen carbon atoms; andX is selected from the group consisting of hydrogen; halogen; alkyl having from one to about twelve carbon atoms; aryl alkyl having from seven to about eighteen carbon atoms; alkoxy having from one to about twelve carbon atoms; phenoxy; arylalkoxy having from seven to about eighteen carbon atoms; and phenyl.
公开/授权文献
- US5352023A Seating and back systems for a wheelchair 公开/授权日：1994-10-04
信息查询
