发明授权
- 专利标题: Filled grid mask
- 专利标题(中): 填充网格面具
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申请号: US160610申请日: 1988-02-26
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公开(公告)号: US4827138A公开(公告)日: 1989-05-02
- 发明人: John N. Randall
- 申请人: John N. Randall
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: G03F1/20
- IPC分类号: G03F1/20 ; H01L21/027 ; H01J37/317
摘要:
A mask (38), which is particularly useful in parallel-printing ion beam lithography because of its dimensional stability, is disclosed. The mask (38) represents a relatively rigid screen (22) constructed from a relatively rigid material, such as monocrystalline silicon, with meshes (28) formed through the screen (22) over the entire area of the screen (22). The preferred embodiment applies a less rigid filler material (34) into the meshes (28) over the entire area of the screen (22), then removes the filler material (34) from transmissive areas (42) of the mask (38).
公开/授权文献
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