Corrosion resistant electrodeposited chromium layers, processes for their electrodepositions and plating baths suitable for use therein are disclosed. The corrosion resistant chromium layers also are bright, adherent, smooth, hard, wear resistant, and exhibit a low coefficient of friction. Electrodeposition is carried out at both high and low currrent densities. The baths used comprise 450-650 g/l of chromic acid, 40-100 g/l of sulfoacetic acid and 0-4.5 g/l of sulfate ion and are substantially free of other carboxylic acids, fluoride ions, iodide ions, bromide ions and selenium ions. The baths used comprise 400-650 g/l of chromic acid, 40-100 g/l of sulfoacetic acid and 0-4.5 g/l of sulfate ion and are substantially free of other carboxylic acids, flouride ions, iodide ions, bromide ions and selenium ions.