发明授权
- 专利标题: Plasma X-ray source
- 专利标题(中): 等离子X射线源
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申请号: US12992申请日: 1987-02-10
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公开(公告)号: US4841556A公开(公告)日: 1989-06-20
- 发明人: Yasuo Kato , Isao Ochiai , Yoshio Watanabe , Seiichi Murayama
- 申请人: Yasuo Kato , Isao Ochiai , Yoshio Watanabe , Seiichi Murayama
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX61-48258 19860307
- 主分类号: H01J35/22
- IPC分类号: H01J35/22 ; H01L21/027 ; H01L21/30 ; H05G2/00
摘要:
A plasma X-ray source in which a discharge tube containing a pair of coaxial cylindrical electrodes is filled with a gas, a high voltage pulse from a charged capacitor is applied between the cylindrical electrodes to convert the gas into a plasma, the plasma is focused on a position near the end of the inner one of the cylindrical electrodes to generate X-rays, and the X-rays thus generated are emitted to the outside of the discharge tube through a window provided thereon, is disclosed. In the above X-ray source, the high voltage pulse is applied between the cylindrical electrodes so that the inner cylindrical electrode is at a negative potential with respect to the outer cylindrical electrode.
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