发明授权
US4845009A Photosensitive composition comprising a polymer with maleimido group in
side chain and a diazo resin
失效
包含侧链中具有马来酰亚胺基的聚合物和重氮树脂的光敏组合物
- 专利标题： Photosensitive composition comprising a polymer with maleimido group in side chain and a diazo resin
- 专利标题（中）： 包含侧链中具有马来酰亚胺基的聚合物和重氮树脂的光敏组合物
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申请号： US908303申请日： 1986-09-17
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公开(公告)号： US4845009A公开(公告)日： 1989-07-04
- 发明人: Nobuyuki Kita , Masanori Imai
- 申请人： Nobuyuki Kita , Masanori Imai
- 申请人地址： JPX Minami-ashigara
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JPX Minami-ashigara
- 优先权： JPX60-218561 19851001
- 主分类号： C08F299/00
- IPC分类号： C08F299/00 ; C08F290/00 ; G03F7/021 ; G03F7/038
摘要：
The present invention relates to a photosensitive composition suitable for the use in the preparation of a photosensitive lithographic plate. The photosensitive composition comprises (1) a polymer having a maleimido group in its side chain and being capable of being photocrosslinked, such as a copolymer of methyl methacrylate/N-[2-(methacryloyloxy)-ethyl]-2,3-dimethylmaleimide/methacrylic acid=15/65/20 (weight ratio) and (2) a diazo resin such as dodecylbenzenesulfonate of condensate of p-diazodiphenylamine and formaldehyde.
公开/授权文献
- US5269669A Tire mold 公开/授权日：1993-12-14
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