发明授权
- 专利标题: Exposure apparatus
- 专利标题(中): 曝光装置
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申请号: US183317申请日: 1988-04-05
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公开(公告)号: US4864360A公开(公告)日: 1989-09-05
- 发明人: Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
- 申请人: Junji Isohata , Koichi Matsushita , Hironori Yamamoto , Makoto Miyazaki , Kunitaka Ozawa , Hideki Yoshinari
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-87551 19850425
- 主分类号: G02F1/13
- IPC分类号: G02F1/13 ; G02F1/1362 ; G03F7/20 ; H01L21/027 ; H01L21/30
摘要:
An apparatus for photolithographically transferring, onto a plate-like member a pattern corresponding to picture elements of a liquid crystal display device and a pattern corresponding to driving circuits and so on, by use of a photomask. The surface of the plate-like member is divided into different areas and, each time one of the different areas of the plate-like member is subjected to the pattern transfer operation, the plate-like member is fed stepwise relative to an optical system provided to project an image of the photomask onto the plate-like member. At the same time, the range of the photomask pattern which is to be transferred onto the plate-like member is changed. By this, a portion of the picture-element pattern and a portion of the circuit pattern are transferred onto each of the different areas on the plate-like member, whereby a large-size pattern contributable to form a large-size display picture plane and a pattern contributable to form a control circuit for controlling the picture plane are transferred on the plate-like member.
公开/授权文献
- US5423414A Evaporative pouch cooler 公开/授权日:1995-06-13