发明授权
- 专利标题： Process for forming pattern film
- 专利标题（中）： 形成图案膜的工艺
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申请号： US921820申请日： 1986-10-17
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公开(公告)号： US4874632A公开(公告)日： 1989-10-17
- 发明人: Yoshitomo Nakagawa , Takashi Kaito , Hisao Houjyo , Masahiro Yamamoto
- 申请人： Yoshitomo Nakagawa , Takashi Kaito , Hisao Houjyo , Masahiro Yamamoto
- 申请人地址： JPX
- 专利权人： Seiko Instruments, Inc.
- 当前专利权人： Seiko Instruments, Inc.
- 当前专利权人地址： JPX
- 优先权： JPX59-38131 19840229
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/72 ; G03F1/74 ; H01L21/027
摘要：
A process for forming a pattern film comprises irradating a predetermined area of a substrate with an ion beam while simultaneously having present a polymerizable or carbonizable organic compound to thereby polymerize or carbonize the compound upon the area, the compound having a vapor pressure at room temperature of 1.times.10.sup.-4 to 5.times.10.sup.-3 Torr. The process is particularly suited for correcting so-called white-spot defects in the manufacture of photomasks.
公开/授权文献
- US6031279A Power semiconductor component 公开/授权日：2000-02-29
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