发明授权
- 专利标题: Process for preparing terephthalic acid of high quality
- 专利标题(中): 制备高品质对苯二甲酸的方法
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申请号: US177951申请日: 1988-04-05
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公开(公告)号: US4877900A公开(公告)日: 1989-10-31
- 发明人: Akio Tamaru , Yoshiaki Izumisawa
- 申请人: Akio Tamaru , Yoshiaki Izumisawa
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Chemical Industries Limited
- 当前专利权人: Mitsubishi Chemical Industries Limited
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-101373 19870424
- 主分类号: C07C63/26
- IPC分类号: C07C63/26 ; C07B61/00 ; C07C51/265 ; C07C51/487
摘要:
The present invention provides a process of preparing terephthalic acid of high quality which is characterized by:oxidizing p-xylene with molecular oxygen in an acetic acid solvent in the presence of a catalyst comprised of at least one heavy metal and bromine at a temperature of from 180.degree. to 230.degree. C. to convert at least 95 wt % of the p-xylene into terephthalic acid and, optionally, subjecting the resultant reaction mixture to low temperature post-oxidation with molecular oxygen at temperatures lower than the temperature of the first oxidation reaction, thereby obtaining a slurry containing terephthalic acid particles whose spectral reflectance defined below is not less than 70% and whose reflectance ratio (400/500) defined below is not less than 0.92;subjecting the slurry to high temperature post-oxidation with molecular oxygen at a temperature of from 235.degree. to 290.degree. C. and then to crystallization; andcollecting the resultant terephthalic acid from the reaction mixture.Spectral reflectance=a spectral reflectance at 500 nm determined according to a white light illumination method.Reflectance ratio (400/500)=(spectral reflectance at 400 nm)/(spectral reflectance at 500 nm).
公开/授权文献
- US6048651A Fresnel zone mask for pupilgram 公开/授权日:2000-04-11
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