发明授权
- 专利标题: Gas-barrier multilayered structure
- 专利标题(中): 气体阻隔多层结构
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申请号: US186080申请日: 1988-04-25
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公开(公告)号: US4908272A公开(公告)日: 1990-03-13
- 发明人: Masahiro Harada , Makoto Matsumura , Toru Kino , Akira Iwamoto , Yoshiaki Momose
- 申请人: Masahiro Harada , Makoto Matsumura , Toru Kino , Akira Iwamoto , Yoshiaki Momose
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人: Mitsubishi Gas Chemical Company, Inc.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-102019 19870427; JPX62-102020 19870427
- 主分类号: B32B27/34
- IPC分类号: B32B27/34 ; C08G69/26 ; C08L77/00
摘要:
A gas-barrier multilayered structure comprising (A) at least one layer of a copolyamide composed of (a) a dicarboxylic acid component composed of 55 to 70 mole % of an aliphatic dicarboxylic acid component and 45 to 30 mole % of an aromatic dicarboxylic acid component consisting substantially of 20 to 30 mole % of isophthalic acid and 5 to 20 mole % of terephthalic acid, and (b) a diamine component composed substantially of a m-xylylenediamine component, and (B) at least one layer of a thermoplastic resin other than the copolyamide. Instead of the layer (A), there can be used (A') at least one layer of a mixture of 40 to 60 % by weight of a first copolyamide composed of (a) a dicarboxylic acid component composed of 55 to 70 mole % of an aliphatic dicarboxylic acid component and 45 to 30 mole % of an aromatic dicarboxylic acid component consisting substantially of 20 to 30 mole % of isophthalic acid and 5 to 20 mole % of terephthalic acid and (b) a diamine component composed substantially of m-xylylenediamine and 60 to 40 % by weight of a second polyamide composed of a dicarboxylic acid component consisting substantially of an aliphthalic dicarboxylic acid component and a diamine component consisting substantially of a m-xylylenediamine component.