- 专利标题: Buried type semiconductor laser device
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申请号: US314363申请日: 1989-02-22
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公开(公告)号: US4908831A公开(公告)日: 1990-03-13
- 发明人: Toshihiko Yoshida , Haruhisa Takiguchi , Shinji Kaneiwa , Hiroaki Kudo , Sadayoshi Matsui
- 申请人: Toshihiko Yoshida , Haruhisa Takiguchi , Shinji Kaneiwa , Hiroaki Kudo , Sadayoshi Matsui
- 申请人地址: JPX
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: JPX
- 优先权: JPX60-184650 19850821; JPX60-201161 19850910; JPX60-202463 19850911; JPX60-203627 19850912; JPX60-207869 19850919
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01S5/223 ; H01S5/227 ; H01S5/24
摘要:
A buried type semiconductor laser device comprising a multi-layered epitaxial growth crystal including a striped laser-oscillation operating area on a semiconductor substrate, wherein said laser-oscillation operating area contains a buffer layer having the same polarity as said substrate, an active layer and a cladding layer having a polarity different from that of said substrate, said laser-oscillation operation area being sandwiched between one part of the burying layer and another part of the burying layer, which are disposed on said substrate and which have a polarity different from that of said substrate, through said substrate or a diffusion region having an impurity with the same polarity as said substrate so as to electrically isolate said burying layer from said cladding layer, thereby maintaining ineffective current flowing from said cladding layer to said burying layer at a low level even when current injected into said device is increased.
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