发明授权
US4918502A Semiconductor memory having trench capacitor formed with sheath electrode 失效
具有形成有护套电极的沟槽电容器的半导体存储器

  • 专利标题: Semiconductor memory having trench capacitor formed with sheath electrode
  • 专利标题(中): 具有形成有护套电极的沟槽电容器的半导体存储器
  • 申请号: US123235
    申请日: 1987-11-20
  • 公开(公告)号: US4918502A
    公开(公告)日: 1990-04-17
  • 发明人: Toru KagaShinichiro KimuraHideo Sunami
  • 申请人: Toru KagaShinichiro KimuraHideo Sunami
  • 申请人地址: JPX Tokyo
  • 专利权人: Hitachi, Ltd.
  • 当前专利权人: Hitachi, Ltd.
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX61-281722 19861128; JPX61-281716 19861128
  • 主分类号: H01L27/108
  • IPC分类号: H01L27/108
Semiconductor memory having trench capacitor formed with sheath electrode
摘要:
The present invention relates to a highly packaged semiconductor memory, and more particularly to a memory cell having a trench capacitor for use in a CMOS memory. The present invention discloses a semiconductor memory employing memory cells each constructed of a trench type charge storage capacitor formed within a substrate, and a switching transistor; one electrode of the capacitor having a sheath-shaped structure which is electrically continuous with the Si substrate at a bottom of a groove and whose sideward periphery is covered with an insulator, the other electrode of the capacitor having a part which is buried inside the sheath electrode and another part which is electrically connected with an impurity diffused layer to function as a source region of the transistor. Further, a structure in which a voltage of 1/2 V.sub.cc can be applied to a plate electrode of a memory cell having a trench capacitor is disclosed.
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