发明授权
- 专利标题: Potential measurement device
- 专利标题(中): 电位测量装置
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申请号: US232655申请日: 1988-08-16
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公开(公告)号: US4922097A公开(公告)日: 1990-05-01
- 发明人: Hideo Todokoro , Hiroyuki Shinada , Shigemitsu Seitoh
- 申请人: Hideo Todokoro , Hiroyuki Shinada , Shigemitsu Seitoh
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-208116 19870824
- 主分类号: H01L21/26
- IPC分类号: H01L21/26 ; G01R31/305 ; H01J37/147 ; H01J37/244 ; H01J37/26 ; H01J37/28 ; H01L21/263
摘要:
A potential measurement device including an irradiator for irradiating a sample with an electron beam; an extracting electrode disposed above the sample and extracting secondary electrons emitted from the part irradiated with the electron beam; a hemi-spherical grid analyzing the energy of the extracted secondary electrons; a lens disposed between the hemispherical grid and the sample and focusing both the electron beam and the secondary electrons; and a deflector disposed on the grid side with respect to the lens and producing electric and magnetic fields crossing perpendicularly to each other, which don't deflect the electron beam, but deflect only the secondary electrons.
公开/授权文献
- US6048639A Thin type sealed cell and producing method thereof 公开/授权日:2000-04-11
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