发明授权
US4922290A Semiconductor exposing system having apparatus for correcting change in
wavelength of light source
失效
具有用于校正光源的波长变化的装置的半导体曝光系统
- 专利标题: Semiconductor exposing system having apparatus for correcting change in wavelength of light source
- 专利标题(中): 具有用于校正光源的波长变化的装置的半导体曝光系统
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申请号: US253562申请日: 1988-10-05
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公开(公告)号: US4922290A公开(公告)日: 1990-05-01
- 发明人: Yasuhiro Yoshitake , Yoshitada Oshida
- 申请人: Yasuhiro Yoshitake , Yoshitada Oshida
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-250585 19871006
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H01L21/027 ; H01L21/30
摘要:
The invention relates to a semiconductor exposing system for projecting a pattern of a mask onto a semiconductor wafer and, more particularly, to such a system having an apparatus for correcting an influence on the resolution by a fluctuation in wavelength of a laser light source. The system of the invention comprises: a laser light source; an optical projecting system for projecting a laser beam emitted from the laser light source onto the semiconductor wafer through the mask; and an apparatus for receiving a part of the laser beam emitted from the laser light source, for detecting the wavelength fluctuation, and for correcting the position and magnification of the optical projecting system in accordance with the wavelength fluctuation value or an apparatus for correcting the refractive index of the optical projecting system.
公开/授权文献
- US5469289A Light scanning device 公开/授权日:1995-11-21