发明授权
- 专利标题: Wafer transfer apparatus having an improved wafer transfer portion
- 专利标题(中): 具有改进的晶片转印部分的晶片传送装置
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申请号: US275525申请日: 1988-11-22
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公开(公告)号: US4923054A公开(公告)日: 1990-05-08
- 发明人: Masami Ohtani , Masami Nishida
- 申请人: Masami Ohtani , Masami Nishida
- 申请人地址: JPX
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX62-181716[U] 19871127
- 主分类号: B65G1/02
- IPC分类号: B65G1/02 ; B65G1/00 ; B65G1/07 ; B65G47/91 ; B65H1/28 ; B65H3/00 ; B65H31/24 ; H01L21/00 ; H01L21/677 ; H01L21/687
摘要:
An apparatus for storing and transferring a wafer. The apparatus includes a wafer transfer portion having a path through which a wafer can be transferred; structure for storing the wafer, the structure for storing the wafer being removably attached to the wafer transfer portion; a first elevator for elevating and lowering the wafer transfer portion and the storing structure to a predetermined level; a holder for temporarily holding the wafer in the wafer transfer portion; and a second elevator for elevating and lowering the wafer holder, the second elevator being separate and independent from the first elevator. Since the wafer storing structure and the wafer transfer portion are elevated and lowered by different elevators, the wafer can be transported while the wafer transfer portion is stationary. Thus, the apparatus has a simplified construction and replacement of the storing structure can be automated.
公开/授权文献
- US5463178A Recording sheet and process for its production 公开/授权日:1995-10-31
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