发明授权
- 专利标题： Alignment and exposure apparatus and method for manufacture of integrated circuits
- 专利标题（中）： 对准和曝光装置及集成电路的制造方法
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申请号： US368881申请日： 1989-06-20
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公开(公告)号： US4937618A公开(公告)日： 1990-06-26
- 发明人: Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
- 申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX59-217307 19841018; JPX59-251924 19841130; JPX59-251925 19841130; JPX59-251926 19841130; JPX59-251927 19841130; JPX59-251928 19841130; JPX59-251929 19841130; JPX59-251930 19841130; JPX59-267454 19841220; JPX60-99512 19850513; JPX60-99513 19850513
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00
摘要：
An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.