发明授权
- 专利标题: Light-sensitive composition
- 专利标题(中): 感光组合物
-
申请号: US241374申请日: 1988-09-07
-
公开(公告)号: US4942109A公开(公告)日: 1990-07-17
- 发明人: Shigeo Koizumi , Nobuyuki Kita
- 申请人: Shigeo Koizumi , Nobuyuki Kita
- 申请人地址: JPX Minami-Ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-Ashigara
- 优先权: JPX62-227492 19870910; JPX62-227493 19870910
- 主分类号: G03F7/095
- IPC分类号: G03F7/095
摘要:
A light-sensitive composition which is developable with an aqueous alkaline solution, comprising (a) at least one light-sensitive resin obtained by adding an active mercaptocarboxylic acid to a part of carbon-carbon unsaturated bonds of a polymer having at least two photodimerizable unsaturated double bonds adjacent to an aromatic nucleus in the main chain thereof and (b) optionally at least one negative-working diazo resin. The light-sensitive composition makes it possible to prepare a light-sensitive plate capable of developing with an aqueous alkaline solution without forming insoluble substances in the developer during the development and the adhesive force between the substrate and the light-sensitive layer of the plate is increased, which in turn substantially improves the printing durability of the lithographic printing plate as a final product.