发明授权
- 专利标题: Molecular beam epitaxy apparatus
- 专利标题(中): 分子束外延装置
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申请号: US329313申请日: 1989-03-27
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公开(公告)号: US4944246A公开(公告)日: 1990-07-31
- 发明人: Haruo Tanaka , Masato Mushiage , Yuhji Ishida
- 申请人: Haruo Tanaka , Masato Mushiage , Yuhji Ishida
- 申请人地址: JPX Kyoto
- 专利权人: Rohm Co., Ltd.
- 当前专利权人: Rohm Co., Ltd.
- 当前专利权人地址: JPX Kyoto
- 优先权: JPX63-42830[U] 19880330; JPX63-77798[U]JPX 19880330
- 主分类号: C23C14/56
- IPC分类号: C23C14/56 ; C30B23/02 ; H01L21/00 ; H01L21/677
摘要:
A molecular beam epitaxy apparatus comprises a growth chamber provided therein with a holder support frame and connected via a first gate valve to a preparation chamber which in turn is connected to a loading chamber via a second gate valve. A first transfer tray arranged in the loading chamber receives a set of substrates from outside and advances into the preparation chamber. A second transfer tray supports a substrate holder in the preparation chamber to allow the set of substrates to be transferred from the first tray onto the holder by the aid of a substrate transfer assembly. The second tray is advanced into the growth chamber to transfer the loaded holder onto the holder support frame.
公开/授权文献
- US5512233A Method of making a panel with a spray formed skin 公开/授权日:1996-04-30