发明授权
US4946764A Method of forming resist pattern and resist processing apparatus used in
this method
失效
在该方法中使用的形成抗蚀剂图案和抗蚀剂处理装置的方法
- 专利标题： Method of forming resist pattern and resist processing apparatus used in this method
- 专利标题（中）： 在该方法中使用的形成抗蚀剂图案和抗蚀剂处理装置的方法
-
申请号： US129907申请日： 1987-12-07
-
公开(公告)号： US4946764A公开(公告)日： 1990-08-07
- 发明人: Yasuo Matsuoka , Takashi Tsuchiya
- 申请人： Yasuo Matsuoka , Takashi Tsuchiya
- 专利权人： Yasuo Matsuoka,Takashi Tsuchiya
- 当前专利权人： Yasuo Matsuoka,Takashi Tsuchiya
- 优先权： JPX59-269985 19841221; JPX59-269986 19841221
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; G03F7/38 ; G03F7/40
摘要：
A method for forming a resist pattern comprises the steps of coating a resist on a substrate, baking the resist, selectively radiating electromagnetic waves or particle rays onto a surface of the resists, and developing the resist. The method further comprises, after the baking step and before the developing step, the step of cooling the resist in such a manner that a temperature control plate is disposed parallel to and adjacent to the substrate.
公开/授权文献
- US6166324A PC card housing with insulative cover and ground feature 公开/授权日：2000-12-26
信息查询
IPC分类:
