发明授权
- 专利标题： Plasma processor
- 专利标题（中）： 等离子处理器
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申请号： US173147申请日： 1988-03-25
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公开(公告)号： US4947085A公开(公告)日： 1990-08-07
- 发明人: Koichiro Nakanishi , Hiroki Ootera , Minoru Hanazaki , Toshihiko Minami
- 申请人： Koichiro Nakanishi , Hiroki Ootera , Minoru Hanazaki , Toshihiko Minami
- 申请人地址： JPX
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX
- 优先权： JPX62-75116 19870327; JPX62-77133 19870330; JPX62-77134 19870330; JPX62-106409 19870501; JPX62-111512 19870506; JPX62-150153 19870618
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A plasma processor wherein a substrate is processed using a plasma in a reaction gas generated through electron cyclotron resonance includes a magnetostatic field generator for generating a magnetostatic field, an electric field generator for generating an r.f. electric field perpendicular to the magnetostatic field, and a moving magnetic field generator for generating a moving magnetic field which intersects the magnetostatic field between the magnetostatic field generator and the substrate.
公开/授权文献
- US5626172A Transfer set 公开/授权日：1997-05-06
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