发明授权
- 专利标题: Photographic light-sensitive material and method of developing the same
- 专利标题(中): 摄影感光材料及其开发方法
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申请号: US162554申请日: 1988-03-01
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公开(公告)号: US4952490A公开(公告)日: 1990-08-28
- 发明人: Shunji Takada , Toshihiro Nishikawa , Kei Sakanoue , Akira Abe
- 申请人: Shunji Takada , Toshihiro Nishikawa , Kei Sakanoue , Akira Abe
- 申请人地址: JPX Minami-ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-ashigara
- 优先权: JPX62-47225 19870302
- 主分类号: G03C1/035
- IPC分类号: G03C1/035 ; G03C7/30
摘要:
A photographic light-sensitive material comprises a support having thereon at least one silver halide emulsion layer. At least 70% of a total number of silver halide grains contained in the emulsion layer are regular crystal grains not having a twinning plane. At least 50 mol% of the regular grains are silver chloride. The regular crystal grains have a (111) crystal plane on 30% or more of a total grain surface and are chemically sensitized in the presence of a gold compound or sulfur and gold compounds.
公开/授权文献
- US5393514A Fluorescent pH indicators 公开/授权日:1995-02-28
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