发明授权
US4962539A Method of recognizing layout and subdivision patterns of radiation images 失效
识别放射图像的布局和细分图案的方法

  • 专利标题: Method of recognizing layout and subdivision patterns of radiation images
  • 专利标题(中): 识别放射图像的布局和细分图案的方法
  • 申请号: US311901
    申请日: 1989-02-17
  • 公开(公告)号: US4962539A
    公开(公告)日: 1990-10-09
  • 发明人: Hideya TakeoKazuo Shimura
  • 申请人: Hideya TakeoKazuo Shimura
  • 申请人地址: JPX Kanagawa
  • 专利权人: Fuji Photo Film Co., Ltd.
  • 当前专利权人: Fuji Photo Film Co., Ltd.
  • 当前专利权人地址: JPX Kanagawa
  • 优先权: JPX63-35835 19880218; JPX63-66753 19880319
  • 主分类号: G06K9/32
  • IPC分类号: G06K9/32
Method of recognizing layout and subdivision patterns of radiation images
摘要:
A method for recognizing the layout pattern of radiation images comprises the steps of preparing two-valued masks, each composed of a two-valued signal representing a layout pattern for radiation images which are to be stored on a stimulable phosphor sheet, and obtaining a preliminary read-out image signal by carrying out preliminary read out on a stimulable phosphor sheet on which radiation images have been stored. The layout pattern of the radiation images is recognized by converting the preliminary read-out image signal into a two-valued image signal, calculating rating values, which represent the degree of pattern matching between the two-valued image signal and the two-valued masks, finding the highest rating value that represents the highest degree of pattern matching among the rating values, and comparing the highest rating value with a predetermined value representing a predetermined degree of pattern matching.
公开/授权文献
信息查询
0/0