发明授权
US4962539A Method of recognizing layout and subdivision patterns of radiation images
失效
识别放射图像的布局和细分图案的方法
- 专利标题: Method of recognizing layout and subdivision patterns of radiation images
- 专利标题(中): 识别放射图像的布局和细分图案的方法
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申请号: US311901申请日: 1989-02-17
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公开(公告)号: US4962539A公开(公告)日: 1990-10-09
- 发明人: Hideya Takeo , Kazuo Shimura
- 申请人: Hideya Takeo , Kazuo Shimura
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX63-35835 19880218; JPX63-66753 19880319
- 主分类号: G06K9/32
- IPC分类号: G06K9/32
摘要:
A method for recognizing the layout pattern of radiation images comprises the steps of preparing two-valued masks, each composed of a two-valued signal representing a layout pattern for radiation images which are to be stored on a stimulable phosphor sheet, and obtaining a preliminary read-out image signal by carrying out preliminary read out on a stimulable phosphor sheet on which radiation images have been stored. The layout pattern of the radiation images is recognized by converting the preliminary read-out image signal into a two-valued image signal, calculating rating values, which represent the degree of pattern matching between the two-valued image signal and the two-valued masks, finding the highest rating value that represents the highest degree of pattern matching among the rating values, and comparing the highest rating value with a predetermined value representing a predetermined degree of pattern matching.
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