发明授权
- 专利标题： Wafer hanger useful for thermally treating semiconductor wafers
- 专利标题（中）： 用于热处理半导体晶片的晶片挂架
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申请号： US424826申请日： 1989-10-20
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公开(公告)号： US4966549A公开(公告)日： 1990-10-30
- 发明人: Mituo Ohdate
- 申请人： Mituo Ohdate
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX1-178424 19890711
- 主分类号： H01L21/22
- IPC分类号： H01L21/22 ; C30B25/12 ; C30B31/14 ; H01L21/673
摘要：
A wafer hanger has a rod member and a supporting member. The rod member is inserted into respective notches formed in semiconductor wafers, and then placed on the supporting member. The wafer hanger holding the wafers is put into a furnace for heat treatment of the wafers. Since the wafers are hung from the rod member, plastic deformation due to the gravity of the wafers is not caused in the wafers.
公开/授权文献
- US5830858A Neurotrophic factor 公开/授权日：1998-11-03