发明授权
US4971877A .alpha.-type titanyl phthalocyanine composition, method for production thereof, and electrophotographic sensitive material using same 失效
α型钛酞菁组合物,其制备方法和使用其的电子照相感光材料

.alpha.-type titanyl phthalocyanine composition, method for production
thereof, and electrophotographic sensitive material using same
摘要:
The first aspect of this invention resides in providing an .alpha.-type titanyl phthalocyanine composition comprising an .alpha.-type titanyl phthalocyanine and metal-free phthalocyanine. This .alpha.-type titanyl phthalocyanine composition is stable, wide in range of absorption wavelengths, and high in spectral sensitivity because it contains an .alpha.-type titanyl phthalocyanine in combination with metal-free phthalocyanine.The second aspect of this invention resides in providing a method for the production of an .alpha.-type titanyl phthalocyanine composition comprising an .alpha.-type titanyl phthalocyanine and a metal-free phthalocyanine, which method comprises pigmenting a concentrated sulfuric acid solution containing at least titanyl phthalocyanine by the acid paste process consisting in pouring said concentrated sulfuric acid solution into water. By this method, an .alpha.-type titanyl phthalocyanine composition stable to withstand the impact of aging can be easily produced.The third aspect of this invention resides in providing an electrophotographic sensitive material having superposed on an electroconductive substrate a sensitive layer compring an .alpha.-type titanyl phthalocyanine and a metal-free phthalocyanine. This electrophotographic sensitive material excels in charging property and dark attenuation property and exhibits high sensitivity and sparing residual potential.The fourth aspect of this invention resides in providing an electrophotographic sensitive material having superposed on an electroconductive substrate a sensitive layer comprising an .alpha.-type titanyl phthalocyanine composition and an electric charge transferring material exhibiting oxidation potential in the range of 0.45 to 0.65 eV. This electrophotographic sensitive material enjoys high sensitivity and shows sparing residual potential.
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