发明授权
- 专利标题： Plasma processing apparatus with a lisitano coil
- 专利标题（中）： 等离子体处理装置，具有硅酸盐线圈
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申请号： US188412申请日： 1988-04-29
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公开(公告)号： US4973883A公开(公告)日： 1990-11-27
- 发明人: Naoki Hirose , Takashi Inugima , Toru Takayama
- 申请人： Naoki Hirose , Takashi Inugima , Toru Takayama
- 申请人地址： JPX Atsugi
- 专利权人： Semiconductor Energy Laborator Co., Ltd.
- 当前专利权人： Semiconductor Energy Laborator Co., Ltd.
- 当前专利权人地址： JPX Atsugi
- 优先权： JPX62-108675 19870501
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. The microwave generator consists of a lisitano coil which is capable of emitting a microwave in the TE.sub.011 mode. In the light of such a microwave, a high quality film can be deposited.
公开/授权文献
- US5417587A Instrument directly mounted shielded connector 公开/授权日：1995-05-23
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