发明授权
- 专利标题： Radiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayer
- 专利标题（中）： 使用两个光敏二盐盐层形成对比度增强图案的放射成像过程，去除覆盖层并在底层中形成抗蚀剂图案
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申请号： US260747申请日： 1988-10-21
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公开(公告)号： US4983500A公开(公告)日： 1991-01-08
- 发明人: Shouichi Uchino , Takao Iwayanagi , Michiaki Hashimoto
- 申请人： Shouichi Uchino , Takao Iwayanagi , Michiaki Hashimoto
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX62-273145 19871030
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; C08K5/23 ; C09D161/04 ; G03C1/00 ; G03C5/00 ; G03F7/00 ; G03F7/016 ; G03F7/038 ; G03F7/095 ; G03F7/11 ; H01L21/027 ; H01L21/30
摘要：
Disclosed is a radiation sensitive composition which comprises a radiation sensitive compound decreased in absorption of radiation upon irradiation with radiation and an organic polymer which, upon being formed into a film, changes in its solubility and decreases in solubility in a desired solvent due to the presence of decomposition product of said radiation sensitive compound which is produced by irradiation with the radiation. A process of formation of pattern using said composition is also disclosed. Fine resist pattern of 0.5 .mu.m line-and-space patterns or less can be formed with sufficiently high contrast.
公开/授权文献
- US5597398A Process for producing glass preform for optical fiber 公开/授权日：1997-01-28