发明授权
- 专利标题: Imidazolidine derivatives as immunosuppressives
- 专利标题(中): 咪唑烷衍生物作为免疫抑制剂
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申请号: US448129申请日: 1989-12-13
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公开(公告)号: US4996219A公开(公告)日: 1991-02-26
- 发明人: Christos Tsaklakidis , Elmar Bosies , Michael Schultz , Rainer Haag , Dieter Herrmann , Wulf Pahlke
- 申请人: Christos Tsaklakidis , Elmar Bosies , Michael Schultz , Rainer Haag , Dieter Herrmann , Wulf Pahlke
- 申请人地址: DEX Mannheim
- 专利权人: Boehringer Mannheim GmbH
- 当前专利权人: Boehringer Mannheim GmbH
- 当前专利权人地址: DEX Mannheim
- 优先权: DEX3841879 19881213
- 主分类号: A61K31/415
- IPC分类号: A61K31/415 ; A61K31/44 ; A61K31/4427 ; A61P37/06 ; C07D233/96 ; C07D401/06 ; C07D405/06 ; C07D409/06
摘要:
The present invention provides compounds of the general formulae: ##STR1## wherein R.sub.1 and R.sub.2, which can be the same or different, are hydrogen atoms or C.sub.1 -C.sub.5 -alkyl radicals, C.sub.3 -C.sub.5 -alkenyl radicals or phenyl radicals or, together with the carbon atom to which they are attached, form a saturated or unsaturated C.sub.3 -C.sub.7 ring, R.sub.3 and R.sub.4, which can be the same or different, are hydrogen atoms, straight-chained or branched C.sub.1 -C.sub.10 -alkyl radicals, straight-chained or branched C.sub.3 -C.sub.7 -alkenyl radicals, C.sub.3 -C.sub.7 -cycloalkyl radicals, C.sub.3 -C.sub.7 -cycloalkenyl radicals, phenyl, arylalkyl or hetarylalkyl radicals, R.sub.5 is a hydrogen atom or a lower alkyl radical and X is an oxygen or sulphur atom or an imino group.The present invention also provides processes for the preparation of these compounds, as well as pharmaceutical compositions with immunosuppressive action containing them.
公开/授权文献
- US5536380A Large area sputter cathode having floating target segments 公开/授权日:1996-07-16
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