发明授权
- 专利标题: Pyrrolin-2-one compounds which are useful as herbicides
- 专利标题(中): 可用作除草剂的吡咯啉-2-酮化合物
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申请号: US442735申请日: 1989-11-28
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公开(公告)号: US5006157A公开(公告)日: 1991-04-09
- 发明人: Nobuyuki Ohba , Atsuhiko Ikeda , Kenji Matsunari , Yuji Yamada , Michiya Hirata , Yasuo Nakamura , Akira Takeuchi , Hiroyuki Karino
- 申请人: Nobuyuki Ohba , Atsuhiko Ikeda , Kenji Matsunari , Yuji Yamada , Michiya Hirata , Yasuo Nakamura , Akira Takeuchi , Hiroyuki Karino
- 申请人地址: JPX Tokyo JPX Tokyo
- 专利权人: Kumiai Chemical Industry Co., Ltd.,Ihara Chemical Industry Co., Ltd.
- 当前专利权人: Kumiai Chemical Industry Co., Ltd.,Ihara Chemical Industry Co., Ltd.
- 当前专利权人地址: JPX Tokyo JPX Tokyo
- 优先权: JPX63-311635 19881209; JPX64-265900 19891012
- 主分类号: C07D211/88
- IPC分类号: C07D211/88 ; A01N43/36 ; A01N43/40 ; C07D207/38 ; C07D211/86
摘要:
A cyclic amide compound of the formula: ##STR1## wherein X is a hydrogen atom, a halogen atom, a lower alkyl group, a haloalkyl group, a lower alkoxy group, a haloalkoxy group, a lower alkylthio group or a nitro group; Y is a hydrogen atom, a halogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, a haloalkyl group, a phenyl group, an alkoxy group, a cycloalkoxy group, a cycloalkylalkoxy group, an alkenyloxy group, an alkynyloxy group, a benzyloxy group, a phenoxy group, a haloalkoxy group, a lower alkoxy-lower alkoxy group, a cyanoalkoxy group, an alkylthio group, an alkenylthio group, an alkynylthio group, a benzylthio group, a phenylthio group, ##STR2## (wherein W is an oxygen atom or a sulfur atom, R.sup.3 is a hydrogen atom or an alkyl group and R.sup.4 is an alkyl group), ##STR3## (wherein each of R.sup.5 and R.sup.6 is a hydrogen atom or a lower alkyl group, an alkylsulfonyl group, ##STR4## (wherein R.sup.5 and R.sup.6 are as defined above), an alkylcarbonyl group, an alkoxy carbonyl group, a hydroxy carbonyl group, a nitro group, a cyano group or a hydroxyl group; R is a hydrogen same or different is an alkyl group, or R.sup.1 and R.sup.2 together with the adjacent carbon atom form a ring; m is 0 or 1; n is an integer of from 1 to 5; and k is an integer of 1 or 2.
公开/授权文献
- US6124184A Method for forming isolation region of semiconductor device 公开/授权日:2000-09-26
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