发明授权
US5016077A Insulated gate type semiconductor device and method of manufacturing the same 失效
绝缘栅型半导体器件及其制造方法

  • 专利标题: Insulated gate type semiconductor device and method of manufacturing the same
  • 专利标题(中): 绝缘栅型半导体器件及其制造方法
  • 申请号: US899025
    申请日: 1986-08-22
  • 公开(公告)号: US5016077A
    公开(公告)日: 1991-05-14
  • 发明人: Masaki SatoShigeru Atsumi
  • 申请人: Masaki SatoShigeru Atsumi
  • 申请人地址: JPX Kawasaki
  • 专利权人: Kabushiki Kaisha Toshiba
  • 当前专利权人: Kabushiki Kaisha Toshiba
  • 当前专利权人地址: JPX Kawasaki
  • 优先权: JPX60-187008 19850826; JPX61-130661 19860605
  • 主分类号: H01L27/088
  • IPC分类号: H01L27/088
Insulated gate type semiconductor device and method of manufacturing the
same
摘要:
An insulated gate type semiconductor device comprising an N channel transistor directly connected to an output terminal of the semiconductor device, the drain region of the N channel transistor comprising a region having a low-impurity concentration contiguous to the channel region, and the source region and a high-impurity concentration, comprising a region having a high-impurity concentration contiguous to the channel region, and an N channel transistor connected between the above mentioned N channel transistor and a low potential, the drain and source regions comprising regions having a high-impurity concentration contiguous to the channel region of the latter-recited N channel transistor.
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