发明授权
- 专利标题: Insulated gate type semiconductor device and method of manufacturing the same
- 专利标题(中): 绝缘栅型半导体器件及其制造方法
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申请号: US899025申请日: 1986-08-22
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公开(公告)号: US5016077A公开(公告)日: 1991-05-14
- 发明人: Masaki Sato , Shigeru Atsumi
- 申请人: Masaki Sato , Shigeru Atsumi
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX60-187008 19850826; JPX61-130661 19860605
- 主分类号: H01L27/088
- IPC分类号: H01L27/088
摘要:
An insulated gate type semiconductor device comprising an N channel transistor directly connected to an output terminal of the semiconductor device, the drain region of the N channel transistor comprising a region having a low-impurity concentration contiguous to the channel region, and the source region and a high-impurity concentration, comprising a region having a high-impurity concentration contiguous to the channel region, and an N channel transistor connected between the above mentioned N channel transistor and a low potential, the drain and source regions comprising regions having a high-impurity concentration contiguous to the channel region of the latter-recited N channel transistor.
公开/授权文献
- US5250510A Superconducting material 公开/授权日:1993-10-05