发明授权
US5027364A Laser diode with buried active layer and lateral current limitation
失效
具有埋层有源层和横向电流限制的激光二极管
- 专利标题: Laser diode with buried active layer and lateral current limitation
- 专利标题(中): 具有埋层有源层和横向电流限制的激光二极管
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申请号: US455411申请日: 1989-12-18
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公开(公告)号: US5027364A公开(公告)日: 1991-06-25
- 发明人: Wolfgang Thulke
- 申请人: Wolfgang Thulke
- 申请人地址: DEX Munich
- 专利权人: Siemens Aktiengesellschaft
- 当前专利权人: Siemens Aktiengesellschaft
- 当前专利权人地址: DEX Munich
- 优先权: DEX3713045 19870416; DEX3713133 19870416
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01L33/00 ; H01S3/06 ; H01S5/042 ; H01S5/10 ; H01S5/223 ; H01S5/227 ; H01S5/24
摘要:
Laser diode with BH double hetero-structure and lateral channels for lateral current limitation, whereby the laser-active stripes are provided with lateral spacer layers and these spacer layers are fashioned before the etching of the lateral channels of a semiconductor material that cannot be attached by the etchant, so that the laser-active stripes have an undamaged, straight line, lateral limitation. This laser diode has a low threshold current and a high differential efficiency given a high output power. Parasitic capacitances are voided by transverse channels and a structured metal contact.
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