发明授权
US5048066A X-ray exposure process for preventing electrostatic attraction or
contact of X-ray masks
失效
用于防止X射线掩模的静电吸引或接触的X射线曝光工艺
- 专利标题： X-ray exposure process for preventing electrostatic attraction or contact of X-ray masks
- 专利标题（中）： 用于防止X射线掩模的静电吸引或接触的X射线曝光工艺
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申请号： US624521申请日： 1990-12-10
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公开(公告)号： US5048066A公开(公告)日： 1991-09-10
- 发明人: Yasuaki Fukuda
- 申请人： Yasuaki Fukuda
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX62-335225 19871229
- 主分类号： G03F1/22
- IPC分类号： G03F1/22 ; G03F7/20
摘要：
Provided are an X-ray mask support member, an X-ray mask, and an X-ray exposure process using the X-ray mask, that can effectively prevent the phenomenon of electrostatic attraction or contact of X-ray masks by appropriately disposing an X-ray mask support membrane in an exposure apparatus that employs soft X-rays. A high precision alignment can be performed.
公开/授权文献
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