发明授权
US5068163A Radiation-sensitive positive working composition and copying material
失效
辐射敏感积极的工作组合物和复制材料
- 专利标题: Radiation-sensitive positive working composition and copying material
- 专利标题(中): 辐射敏感积极的工作组合物和复制材料
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申请号: US362688申请日: 1989-06-07
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公开(公告)号: US5068163A公开(公告)日: 1991-11-26
- 发明人: Andreas Elsaesser , Werner Frass , Dieter Mohr
- 申请人: Andreas Elsaesser , Werner Frass , Dieter Mohr
- 申请人地址: DEX Frankfurt am Main
- 专利权人: Hoechst Aktiengesellschaft
- 当前专利权人: Hoechst Aktiengesellschaft
- 当前专利权人地址: DEX Frankfurt am Main
- 优先权: DEX3820699 19880618
- 主分类号: G03F7/022
- IPC分类号: G03F7/022 ; G03F7/004 ; G03F7/023 ; G03F7/032 ; G03F7/039 ; H01L21/027 ; H01L21/30
摘要:
The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of:1) a compound forming strong acid when exposed to actinic radiation and2) a compound containing at least one acid-cleavable C--O--C bond,and a binder with repeating units of the general formula I ##STR1## wherein R.sub.1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group,R.sub.2, R.sub.3, R.sub.4 are identical or different and denote hydrogen, or alkyl or aryl groups,R.sub.5, R.sub.6 and optionally R.sub.7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, andX denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, andn is 1, 2 or 3.The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.
公开/授权文献
- US5546068A Sense amplifier 公开/授权日:1996-08-13