发明授权
- 专利标题: Microwave induced plasma source
- 专利标题(中): 微波诱导等离子体源
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申请号: US473430申请日: 1990-02-01
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公开(公告)号: US5086255A公开(公告)日: 1992-02-04
- 发明人: Yukio Okamoto , Makoto Yasuda , Masataka Koga
- 申请人: Yukio Okamoto , Makoto Yasuda , Masataka Koga
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-033579 19890215
- 主分类号: H01J49/12
- IPC分类号: H01J49/12 ; H01J49/10 ; H05H1/46
摘要:
A microwave induced plasma source includes a coaxial waveguide made up of a cylindrical outer conductor and an inner conductor which has the form of a helical coil, a discharge tube inserted into the helical coil in the axial direction thereof, and having an inner tube for introducing a sample and an outer tube for introducing a plasma gas so that a double tube structure is formed, a discharge-tube cooling device for causing a cooling gas to flow along the outer periphery of the discharge tube in directions parallel to the axis thereof, and a microwave power source for supplying microwave power to the coaxial waveguide. When the microwave induced plasma source is used as the light source of a spectrometer or the ion source of a mass spectrometer, a trace element can be readily determined qualitatively or quantitatively.
公开/授权文献
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