发明授权
- 专利标题: Gas-sensitive device
- 专利标题(中): 气敏装置
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申请号: US563321申请日: 1990-07-26
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公开(公告)号: US5086286A公开(公告)日: 1992-02-04
- 发明人: Yoshikazu Yasukawa , Norihiro Inagaki
- 申请人: Yoshikazu Yasukawa , Norihiro Inagaki
- 申请人地址: JPX Shizuoka
- 专利权人: Kurabe Industrial Co., Ltd.
- 当前专利权人: Kurabe Industrial Co., Ltd.
- 当前专利权人地址: JPX Shizuoka
- 优先权: JPX1-196131 19890728
- 主分类号: G01N27/12
- IPC分类号: G01N27/12 ; G01N33/00 ; H01C7/00
摘要:
A thin film gas-sensitive device includes an insulating substrate having a pair of electrodes, a gas-sensitive layer having a gas sensitive substance deposited on the insulating substrate and electrodes, and a catalytic layer deposited on the gas-sensitive layer and insulating substrate as a non-continuous layer. The insulating substrate is partly uncovered because the electrodes, the gas-sensitive layer containing the gas-sensitive substance and the catalytic layer do not thoroughly cover the substrate.