发明授权
- 专利标题: Thin film vacuum evaporation device
- 专利标题(中): 薄膜真空蒸发装置
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申请号: US513846申请日: 1990-04-24
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公开(公告)号: US5097793A公开(公告)日: 1992-03-24
- 发明人: Akira Shuhara , Kazuhiro Oka , Takeshi Morita , Megumi Ohmine
- 申请人: Akira Shuhara , Kazuhiro Oka , Takeshi Morita , Megumi Ohmine
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-118199 19890511; JPX1-160459 19890622
- 主分类号: C23C14/28
- IPC分类号: C23C14/28
摘要:
A thin film vacuum evaporation device having a reaction gas supplier for locally supplying a reaction gas to the evaporating point on a target. The device includes a reaction chamber that can be kept under vacuum with a light transmitting window disposed therein allowing the passage of a laser beam on the target. Also, a differential pressure chamber may be provided between the target and the light transmitting window, and a gas introducing section may be connected to the differential pressure chamber. Thus, the vapor generated by the target is prevented from adhering to the light transmitting window, and the light transmitting window can be kept clean.
公开/授权文献
- US5792609A Detection of malaria 公开/授权日:1998-08-11
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