发明授权
- 专利标题: Visible light sensitive electrodeposition coating composition and image-forming method using the same
- 专利标题(中): 可见光敏感电沉积涂料组合物和使用其的成像方法
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申请号: US413677申请日: 1989-09-28
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公开(公告)号: US5102775A公开(公告)日: 1992-04-07
- 发明人: Motoko Okuhara , Ichiro Yoshihara , Yasuo Doi , Takao Yamamoto , Kenji Seko , Yutaka Yoshikawa , Naozumi Iwasawa
- 申请人: Motoko Okuhara , Ichiro Yoshihara , Yasuo Doi , Takao Yamamoto , Kenji Seko , Yutaka Yoshikawa , Naozumi Iwasawa
- 申请人地址: JPX Kanagawa
- 专利权人: Kansai Paint Co., Ltd.
- 当前专利权人: Kansai Paint Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX63-246394 19880930; JPX1-178041 19890712
- 主分类号: C08F2/50
- IPC分类号: C08F2/50 ; G03F7/004 ; G03F7/038 ; G03F7/16
摘要:
A composition for visible light sensitive electrodeposition coating which comprises (A) a photocurable resin having light sensitive groups capable of being crosslinked or polymerized by light irradiation and ionic groups, (B) a sensitizer which is excited by absorption of visible light and has a property to interact with the resin (A), (C) a water-insoluble polymerization initiator, and optionally, (D) at least one specific nitrogen-containing compound; and an image-forming method which comprises (i) coating the surface of a conductor by electrodeposition with the aforesaid composition, (ii) exposing the resulting film by electrodeposition by partially irradiating the film with visible light, and then (iii) contacting the resulting film with a developing solution to remove the unexposed areas.
公开/授权文献
- US4525458A Method for the production of sphingomyelinase 公开/授权日:1985-06-25
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