Invention Grant
- Patent Title: Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound
- Patent Title (中): 含有碱可溶性酚醛树脂，感光性喹喔啉化合物和含硫化合物的阳性光电组合物
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Application No.: US648954Application Date: 1991-02-01
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Publication No.: US5106718APublication Date: 1992-04-21
- Inventor: Ekkehard Bartmann , Reinhard Schulz , Horst Munzel
- Applicant: Ekkehard Bartmann , Reinhard Schulz , Horst Munzel
- Applicant Address: NY Ardsley
- Assignee: Ciba-Geigy Corporation
- Current Assignee: Ciba-Geigy Corporation
- Current Assignee Address: NY Ardsley
- Priority: DEX3835737 19881020
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/022 ; H01L21/027
Abstract:
The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.
Public/Granted literature
- USD288748S Chair Public/Granted day:1987-03-17
Information query
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