发明授权
- 专利标题: Silicon thin film transistor and method for producing the same
- 专利标题(中): 硅薄膜晶体管及其制造方法
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申请号: US564815申请日: 1990-08-08
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公开(公告)号: US5109260A公开(公告)日: 1992-04-28
- 发明人: Sakae Tanaka , Yoshiaki Watanabe , Katsuo Shirai , Yoshihisa Ogiwara
- 申请人: Sakae Tanaka , Yoshiaki Watanabe , Katsuo Shirai , Yoshihisa Ogiwara
- 申请人地址: JPX Tokyo JPX Tochigi
- 专利权人: Seikosha Co., Ltd.,Nippon Precision Circuits Ltd.
- 当前专利权人: Seikosha Co., Ltd.,Nippon Precision Circuits Ltd.
- 当前专利权人地址: JPX Tokyo JPX Tochigi
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/417 ; H01L29/786
摘要:
A silicon thin film transistor array includes a plurality of silicon thin film transistors in an array-like form, each silicon thin film transistor including an insulating substrate, a gate electrode formed on the insulating substrate, a gate insulating layer formed on the insulating substrate containing the gate electrode, a pair of first impurity contained silicon layers formed on the gate insulating layer in such a manner as to transversely cross a terminal part of the gate electrode, an intrinsic silicon layer formed on the pair of first impurity contained silicon layers and on the gate insulating layer between the pair of first impurity contained silicon layers in such a manner as to connect the pair of first impurity contained silicon layers, a protective insulation layer formed on the intrinsic silicon layer, and a source electrode and a drain electrode formed at contact parts of the pair of first impurity contained silicon layers; gate wiring for connecting the gate electrodes of the silicon thin film transistors to each other; and source wiring for connecting the source electrodes of the silicon thin film transistors to each other.
公开/授权文献
- US4541118A SSB System with pilot coded squelch 公开/授权日:1985-09-10
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