发明授权
- 专利标题: Soluble polyarylene ether sulfones
- 专利标题(中): 可溶性聚亚烷基硫醚
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申请号: US665492申请日: 1991-03-06
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公开(公告)号: US5126427A公开(公告)日: 1992-06-30
- 发明人: Rudolf Pfaendner , Thomas Kainmuller , Kurt Hoffmann , Friedrich Stockinger , Andreas Kramer
- 申请人: Rudolf Pfaendner , Thomas Kainmuller , Kurt Hoffmann , Friedrich Stockinger , Andreas Kramer
- 申请人地址: NY Ardsley
- 专利权人: Ciba-Geigy Corporation
- 当前专利权人: Ciba-Geigy Corporation
- 当前专利权人地址: NY Ardsley
- 优先权: CHX790/90 19900312
- 主分类号: C08G75/00
- IPC分类号: C08G75/00 ; C08G75/23 ; C08J5/18 ; C08L63/00 ; C09D181/00 ; C09D181/06
摘要:
Polyarylene ether sulfones which have a reduced viscosity of 0.1 to 2.0 dl/g, measured at 25.degree. C. in a 1% solution in N-methylpyrrolidone (NMP), and which contain, based on the total number of structural units present in the polyarylene ether sulfone resin, 99-1 mol % of a recurring structural unit of formula I ##STR1## and 1-99 mol % of a recurring structural unit of formula II--O--Ar.sub.2 --O--Ar.sub.1 -- (II)wherein the aromatic rings in the structural unit of formula I are unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, Ar.sub.1 is a radical of formula IIIa-IIIc ##STR2## wherein a is 0 or 1, ##STR3## which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, and Ar.sub.2 is a radical of formula IVa-IVe ##STR4## wherein b is 0 or 1 ##STR5## wherein c is 0 or 1 ##STR6## wherein Z is --CO--, --SO.sub.2 --, --SO--, --S--, --O--, ##STR7## wherein R is methyl or phenyl, which radical is unsubstituted or substituted by one or more C.sub.1 -C.sub.4 alkyl groups, C.sub.1 -C.sub.4 alkoxy groups or halogen atoms, are soluble in customary organic solvents and can be processed from the solution to films or incorporated in other matrix resins.
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