发明授权
- 专利标题: X-ray exposure system
- 专利标题(中): X射线曝光系统
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申请号: US641332申请日: 1991-01-15
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公开(公告)号: US5128975A公开(公告)日: 1992-07-07
- 发明人: Kazunori Iwamoto , Shunichi Uzawa , Takao Kariya , Ryuichi Ebinuma
- 申请人: Kazunori Iwamoto , Shunichi Uzawa , Takao Kariya , Ryuichi Ebinuma
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-252761 19881005
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G03F7/20 ; H01L21/027 ; H01L21/30
摘要:
An X-ray exposure system for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask and the wafer are held on a main frame so that their surfaces extend substantially parallel to a vertical axis. The main frame suspends from a supporting frame through a plurality of air mounts, each being vertically displaceable. The supporting frame is placed on the same reference surface as that of an SOR ring that produces synchrotron radiation. By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation, as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.
公开/授权文献
- US5997680A Method of producing printed media 公开/授权日:1999-12-07