发明授权
- 专利标题: Method for forming ceramic films by anode-spark discharge
- 专利标题(中): 通过阳极喷射形成陶瓷膜的方法
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申请号: US573703申请日: 1990-08-28
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公开(公告)号: US5147515A公开(公告)日: 1992-09-15
- 发明人: Haruo Hanagata , Tsukasa Suzuki , Kazuo Yanagida , Hidesato Igarashi
- 申请人: Haruo Hanagata , Tsukasa Suzuki , Kazuo Yanagida , Hidesato Igarashi
- 申请人地址: JPX Tokyo
- 专利权人: Dipsol Chemicals Co., Ltd.
- 当前专利权人: Dipsol Chemicals Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-228639 19890904; JPX2-54827 19900306
- 主分类号: C25D9/06
- IPC分类号: C25D9/06
摘要:
A method for forming a ceramics film on the surface of a substrate comprises performing spark discharge in an electrolytic bath, wherein the electrolytic bath comprises an aqueous solution of a water-soluble or colloidal silicate and/or an oxyacid salt to which ceramics fine particles and/or specific fine particles are dispersed and the spark discharge is carried out in the electrolytic bath while ensuring the suspended state of the ceramics particles and/or the specific fine particles in the electrolytic bath. The method makes it possible to effectively form, on the surface of a metal substrate, ceramics films having a variety of color tones as well as excellent insulating properties and hardness. Moreover, it further makes it possible to effectively form a composite ceramics film having excellent wear resistance on the surface of a metal substrate.
公开/授权文献
- US5672870A Mass selective notch filter with quadrupole excision fields 公开/授权日:1997-09-30
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