发明授权
- 专利标题: Exposure apparatus
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申请号: US830449申请日: 1992-02-05
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公开(公告)号: US5150391A公开(公告)日: 1992-09-22
- 发明人: Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa
- 申请人: Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-049583 19900302
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00 ; H01L21/027 ; H01L21/30
摘要:
An exposure apparatus for transferring a pattern of an original onto a workpiece, includes a blocking member for defining a rectangular exposure region with respect to at least one of the original and the workpiece, wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member. Plural detection systems detect a positional deviation between the original and the workpiece, each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages each carryies thereon corresponding one of the first movable stages, and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable state is operable to displace the light blocking member to change the rectangular exposure region.
公开/授权文献
- US4160453A Apparatus for implanting hair 公开/授权日:1979-07-10