发明授权
- 专利标题： Projecting and exposing device
- 专利标题（中）： 投影和曝光装置
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申请号： US621427申请日： 1990-12-05
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公开(公告)号： US5159483A公开(公告)日： 1992-10-27
- 发明人: Toshiyuki Watanabe , Masaki Suzuki
- 申请人： Toshiyuki Watanabe , Masaki Suzuki
- 申请人地址： JPX Osaka
- 专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人： Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址： JPX Osaka
- 优先权： JPX1-318028 19891207
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027 ; H01L21/30
摘要：
A projecting and exposing device includes a light source and a device for projecting light emitted by the light source to a mask. At least one inverting or erect projecting optical system is provided for projecting an area of a part of the pattern of the mask onto a substrate in the ratio of N to 1. A scanning device moves the projecting optical system in a speed ratio of N:1 so as to scan the mask and expose the substrate to the light coming from a pattern of the mask. A device also moves the mask and the substrate in the speed ratio of N:1.
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