发明授权
US5161177A Substrate holding apparatus for holding a substrate in an exposure apparatus 失效
用于在曝光装置中保持基板的基板保持装置

  • 专利标题: Substrate holding apparatus for holding a substrate in an exposure apparatus
  • 专利标题(中): 用于在曝光装置中保持基板的基板保持装置
  • 申请号: US779897
    申请日: 1991-10-21
  • 公开(公告)号: US5161177A
    公开(公告)日: 1992-11-03
  • 发明人: Yuji Chiba
  • 申请人: Yuji Chiba
  • 申请人地址: JPX Tokyo
  • 专利权人: Canon Kabushiki Kaisha
  • 当前专利权人: Canon Kabushiki Kaisha
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX2-287290 19901026
  • 主分类号: G03F7/20
  • IPC分类号: G03F7/20 G21K1/10 G21K5/08 H01L21/027
Substrate holding apparatus for holding a substrate in an exposure
apparatus
摘要:
A substrate holding apparatus for vertically holding a substrate to be exposed by radiation includes a substrate stage having a substrate holding surface for attracting a substrate. The substrate holding surface is divided into an inner peripheral portion and an outer peripheral portion by a groove formed in the substrate stage. A magnetic member is fitted into the groove of the substrate stage, and at least a magnetic unit is embedded in the magnetic member. The magnetic unit includes a permanent magnet and an electromagnet for eliminating a magnetic force of the permanent magnet when energized. Further, a moving device is provided for moving the magnetic member together with the magnetic unit in a direction of the depth of the groove between a first position in which the magnetic force of the permanent magnet is effective for the substrate on the substrate holding surface and a second position in which the magnetic force of the permanent magnet is ineffective for the substrate on the substrate holding surface. The electromagnet need not be energized during a substrate positioning period if the magnetic member with the magnetic unit is brought to the second position.
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