发明授权
US5168983A Process for removing impurities from the mixture of cyclohexanone and
cyclohexanol
失效
从CYCLOHEXANONE和CYCLOHEXANOL混合物中清除污染物的方法
- 专利标题: Process for removing impurities from the mixture of cyclohexanone and cyclohexanol
- 专利标题(中): 从CYCLOHEXANONE和CYCLOHEXANOL混合物中清除污染物的方法
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申请号: US673388申请日: 1991-03-22
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公开(公告)号: US5168983A公开(公告)日: 1992-12-08
- 发明人: Kazuo Tan , Kazuhiro Fujii , Michio Nakamura , Kazunao Hanada
- 申请人: Kazuo Tan , Kazuhiro Fujii , Michio Nakamura , Kazunao Hanada
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Kasei Corporation
- 当前专利权人: Mitsubishi Kasei Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-91639 19900406
- 主分类号: C07C27/28
- IPC分类号: C07C27/28 ; C07C29/80 ; C07C35/08 ; C07C45/33 ; C07C45/82 ; C07C49/403
摘要:
A process for separating cyclohexanol and other impurities from a mixture containing cyclohexanone and cyclohexanol is disclosed. In this process a mixture of cyclohexanone and cyclohexanol are introduced into a first distillation column from which low-boiling components are distilled; the bottoms of the first distillation column are then fed to a second distillation column from which cyclohexanone is distilled; the bottoms of the second distillation column are fed to a third distillation column from which cyclohexanol and other impurities are removed; and the distillate of the third distillation column is then circulated into the first distillation column via a dehydrogenation zone; wherein the pressures at the tops of the first, second, and third distillation columns are maintained at 20 to 400 Torr; part of the bottoms of the second distillation column is supplied to a fourth distillation column having a pressure at the top of 500 to 2,500 Torr, and from which low-boiling components are removed; the distillate of the fourth distillation column is circulated into either the first distillation column, the second distillation column, the third distillation column or the dehydrogenation zone; and the bottoms of the third and fourth distillation columns are not circulated.