发明授权
- 专利标题: Hologram scale having moisture resistance
- 专利标题(中): HOLOGRAM规模具有防潮性
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申请号: US486314申请日: 1990-02-28
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公开(公告)号: US5172250A公开(公告)日: 1992-12-15
- 发明人: Hideki Tsuchiya , Kenichi Sato , Hiroyuki Ohkubo
- 申请人: Hideki Tsuchiya , Kenichi Sato , Hiroyuki Ohkubo
- 申请人地址: JPX
- 专利权人: Sony Magnescale, Inc.
- 当前专利权人: Sony Magnescale, Inc.
- 当前专利权人地址: JPX
- 优先权: JPX1-47901 19890228; JPX1-279317 19891026
- 主分类号: G01D5/347
- IPC分类号: G01D5/347 ; G01D13/04 ; G03H1/02
摘要:
A hologram scale having a base substrate, a hologram film with a diffraction grating of a desired pitch exposed thereon, adhered to the base substrate, and with a protective substrate to protect the hologram film is manufactured by the following method: a hologram of a laser produced diffraction grating is formed on a holographic film to act as a scale. This film is applied on a central portion of a base substrate. Adhesives having moisture resistance are applied between the base and the protective substrates to essentially surround the hologram film positioned on the base substrate. The protective and the base substrates are sealed integrally by the adhesives, securing the hologram film therein so as to protect it from ambient environmental conditions.
公开/授权文献
- US4538886A Circular arc solar concentrator 公开/授权日:1985-09-03
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