发明授权
- 专利标题: Gas laser apparatus
- 专利标题(中): 气体激光装置
-
申请号: US708498申请日: 1991-05-31
-
公开(公告)号: US5197078A公开(公告)日: 1993-03-23
- 发明人: Mitsugu Terada , Ken Ohmata , Michito Uehara , Hideaki Shibata , Yasuo Oeda , Yuichiro Terashi
- 申请人: Mitsugu Terada , Ken Ohmata , Michito Uehara , Hideaki Shibata , Yasuo Oeda , Yuichiro Terashi
- 申请人地址: JPX Tokyo
- 专利权人: Mitsui Petrochemical Industries, Ltd.
- 当前专利权人: Mitsui Petrochemical Industries, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-143447 19900601; JPX2-192156 19900720
- 主分类号: H01S3/034
- IPC分类号: H01S3/034 ; H01S3/036
摘要:
A gas laser apparatus having transparent laser windows provided on a laser chamber body, in which operating gases is sealed if necessary, comprising circulation means connected to the laser chamber body through an intake port and a discharge port for circulating gases within the laser chamber body and filtration means disposed in said circulation means, further comprising cutoff means for preventing the laser windows from being stained and open and closeably cutting off between the laser chamber body and the laser windows, and having a construction wherein in replacing the laser window, the cutoff means is once placed in a cutoff state, and the laser window is separated from the laser chamber body to place the laser window.
公开/授权文献
- US5822355A Dual cavity laser 公开/授权日:1998-10-13