发明授权
US5210155A Phenol terminated diester compositions derived from dicarboxylic acids,
polyester polymers or alkyd polymers, and curable compositions
containing same
失效
衍生自二羧酸,聚酯聚合物或ALKYD聚合物的酚醛脱模剂组合物和含有其的可固化组合物
- 专利标题: Phenol terminated diester compositions derived from dicarboxylic acids, polyester polymers or alkyd polymers, and curable compositions containing same
- 专利标题(中): 衍生自二羧酸,聚酯聚合物或ALKYD聚合物的酚醛脱模剂组合物和含有其的可固化组合物
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申请号: US572754申请日: 1990-08-24
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公开(公告)号: US5210155A公开(公告)日: 1993-05-11
- 发明人: Albert I. Yezrielev , William E. Wellman , Ralph M. Kowalik , George A. Knudsen , Michael G. Romanelli
- 申请人: Albert I. Yezrielev , William E. Wellman , Ralph M. Kowalik , George A. Knudsen , Michael G. Romanelli
- 申请人地址: NJ Linden
- 专利权人: Exxon Chemical Patents Inc.
- 当前专利权人: Exxon Chemical Patents Inc.
- 当前专利权人地址: NJ Linden
- 主分类号: C08G63/02
- IPC分类号: C08G63/02 ; C07C69/017 ; C08G63/06 ; C08G63/123 ; C08G63/16 ; C08G63/19 ; C08G63/688 ; C08K5/13 ; C08K5/17 ; C08L67/00 ; C08L67/02 ; C09D167/00 ; C09D167/02
摘要:
The present invention is directed towards non-liquid crystalline phenol-terminated diester compositions which may be liquids or solids and crosslinkable formulations containing a mixture of the phenol terminated diesters and an amino crosslinking agent. These diesters are characterized by the structure of formula 1: ##STR1## wherein R is an aliphatic divalent hydrocarbon radical containing 2 to 40 carbon atoms or a mixture of such radicals, provided however that R contains at least about 8 carbon atoms when n is 0 and p is 0, R.sub.1 is an aliphatic or cycloaliphatic hydrocarbon radical containing 2 to 40 carbon atoms or a mixture of such radicals, R.sub.2 is an aliphatic, aromatic or a mixture of aliphatic and aromatic hydrocarbon radicals having from 2 to 40 carbon atoms, A is divalent aromatic radical selected from the group consisting of phenylene, naphthylene or bis phenylene, p is 0 or 1, n is 0 or an integer ranging from 1 to about 40, provided however, that p is 0 when n is 0 and p is 1 when n is an integer.
公开/授权文献
- US5715814A Respiration mask 公开/授权日:1998-02-10