发明授权
US5214662A Semiconductor optical devices with pn current blocking layers of
wide-band gap materials
失效
半导体光电器件,带宽带隙材料的PN电流阻挡层
- 专利标题: Semiconductor optical devices with pn current blocking layers of wide-band gap materials
- 专利标题(中): 半导体光电器件,带宽带隙材料的PN电流阻挡层
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申请号: US791767申请日: 1991-11-15
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公开(公告)号: US5214662A公开(公告)日: 1993-05-25
- 发明人: Michinori Irikawa , Masayuki Iwase
- 申请人: Michinori Irikawa , Masayuki Iwase
- 申请人地址: JPX Tokyo
- 专利权人: Furukawa Electric Co., Ltd.
- 当前专利权人: Furukawa Electric Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX2-311119 19901116; JPX2-326481 19901128
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01S5/227
摘要:
A semiconductor optical device comprising a mesa shaped double heterostructure having an active layer on an InP substrate, and pn junction current blocking layers embedded at all sides of the said double heterostructure, wherein at least portion of said current blocking layers consists of a semiconductor layer lattice-matched to InP and having a band gap larger than that of the InP at a room temperature. Therefore, the current blocking characteristics of the current blocking layer is improved so that the increase of leakage current under operating condition of high temperature and high output power is well suppressed, and the nonlinearity in the optical output-current characteristic is drastically reduced even under such operating conditions.
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