发明授权
- 专利标题： Process for the oxidation of materials in water at supercritical temperatures utilizing reaction rate enhancers
- 专利标题（中）： 使用反应速率增强剂在超临界温度下在水中氧化材料的方法
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申请号： US973217申请日： 1992-11-06
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公开(公告)号： US5232604A公开(公告)日： 1993-08-03
- 发明人: Kathleen C. Swallow , William R. Killilea , Glenn T. Hong , Alain L. Bourhis
- 申请人： Kathleen C. Swallow , William R. Killilea , Glenn T. Hong , Alain L. Bourhis
- 申请人地址： TX Houston
- 专利权人： Modar, Inc.
- 当前专利权人： Modar, Inc.
- 当前专利权人地址： TX Houston
- 主分类号： C02F1/02
- IPC分类号： C02F1/02 ; C02F1/72 ; C02F1/74 ; C02F1/76 ; C02F1/78 ; C02F11/08 ; F01K3/18
摘要：
Disclosed is a method of substantially completely oxidizing material in an aqueous phase at supercritical temperatures and sub- or supercritical pressures by initiating the oxidation in the presence of small amounts of strong oxidizing agents that function to increase the initial reaction rate for the oxidation. The strong oxidizing agents suitable for use in the present invention comprise at least one selected from the group consisting of ozone (O.sub.3), hydrogen peroxide (H.sub.2 O.sub.2), salts containing persulfate (S.sub.2 O.sub.8.sup.2-), salts containing permanganate (MnO.sub.4.sup.-), nitric acid (HNO.sub.3), salts containing nitrate (NO.sub.3.sup.-), oxyacids of chlorine and their corresponding salts, hypochlorous acid (HOCl), salts containing hypochlorite (OCl.sup.-), chlorous acid (HOClO), salts containing chlorite (ClO.sub.2.sup.-), chloric acid (HOClO.sub.2), salts containing chlorate (ClO.sub.3.sup.), perchloric acid (HOClO.sub.3), and salts containing perchlorate (ClO.sub.4.sup.-).
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