发明授权
- 专利标题: Method for the preparation of an oximesilane compound
- 专利标题(中): 制备氧化硅化合物的方法
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申请号: US976043申请日: 1992-11-13
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公开(公告)号: US5241095A公开(公告)日: 1993-08-31
- 发明人: Isao Watanuki , Hiroshi Tsumura , Kazushi Satoh , Nobuhiko Kodana
- 申请人: Isao Watanuki , Hiroshi Tsumura , Kazushi Satoh , Nobuhiko Kodana
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-325345 19911113
- 主分类号: C07F7/08
- IPC分类号: C07F7/08
摘要:
An efficient and safe method is proposed for the preparation of an oximesilane compound having a group of the general formula --O--N.dbd.CR.sup.2 R.sup.3, in which R.sup.2 and R.sup.3 are each a hydrogen atom or a monovalent hydrocarbon group, bonded to the silicon atom. The method consists of successive steps of which the first is for the reaction of a chlorosilane compound with ammonia and the second is for the reaction of the reaction mixture coming from the first step with an oxime compound to introduce the oxime groups as bonded to the silicon atom. Different from conventional methods in which formation of an explosive compound such as hydrochloride of an organic base or oxime compound is unavoidable, the inventive method does not involve formation of such an explosive by-product so that the desired oximesilane compound can be obtained without the danger of explosion.
公开/授权文献
- US5960244A Image formation apparatus 公开/授权日:1999-09-28
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